| # | Country | Total Patents | |
|---|---|---|---|
| #1 | China | 3 | |
| #2 | Republic of Korea | 3 | |
| #3 | Taiwan | 3 | |
| #4 | WIPO (World Intellectual Property Organization) | 2 | |
| #5 | United States | 1 |
| # | Industry | |
|---|---|---|
| #1 | Audio-visual technology | |
| #2 | Optics | |
| #3 | Semiconductors | |
| #4 | Macromolecular chemistry and polymers |
| # | Name | Total Patents |
|---|---|---|
| #1 | Watanabe Shigeki | 10 |
| #2 | Nakagawara Hidetaka | 10 |
| #3 | Watanabe Kazuo | 10 |
| #4 | Ueda Akifumi | 10 |
| #5 | Lin Chao Wen | 5 |
| #6 | Lan Wen Jen | 4 |
| #7 | Okada Shintaro | 4 |
| #8 | Fujita Saki | 4 |
| #9 | Akifumi Ueda | 2 |
| #10 | Hidetaka Nakagawara | 2 |
| Publication | Filing date | Title |
|---|---|---|
| WO2011081131A1 | Photosensitive resin composition, photosensitive dry film, and pattern forming method | |
| CN102782578A | Photosensitive resin composition, photosensitive dry film, and pattern forming method |