K LAB CO LTD has a total of 13 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2001. It filed its patents most often in Republic of Korea, China and EPO (European Patent Office). Its main competitors in its focus markets optics, machine tools and measurement are TAEKWANG TECH, ADVANCED LASER SEPARATION INTE and GSI LUMONICS CORP.
# | Country | Total Patents | |
---|---|---|---|
#1 | Republic of Korea | 9 | |
#2 | China | 1 | |
#3 | EPO (European Patent Office) | 1 | |
#4 | Japan | 1 | |
#5 | United States | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Machine tools | |
#3 | Measurement | |
#4 | Surface technology and coating | |
#5 | Semiconductors | |
#6 | Control | |
#7 | Textiles and paper | |
#8 | Electrical machinery and energy | |
#9 | Environmental technology |
# | Name | Total Patents |
---|---|---|
#1 | Kwon Goo Cheol | 7 |
#2 | Lim Hak Gyu | 3 |
#3 | Nam Chang Woo | 2 |
#4 | Han Yu Hui | 1 |
#5 | Han You Hie | 1 |
#6 | Kim Yeong Tae | 1 |
#7 | Kwon Gu Cheol | 1 |
#8 | Shin Ho Sik | 1 |
#9 | Kwon Goo-Cheol | 1 |
#10 | Kim Gi Won | 1 |
Publication | Filing date | Title |
---|---|---|
US2017328807A1 | Focusing state measuring apparatus | |
KR20180021526A | Carrier gas heating apparatus | |
KR20180018172A | Thin film deposition device | |
KR20180002276A | sputtering device | |
KR20150005765A | Method and apparatus for calibrating a laser marking system | |
KR101128871B1 | Cutting apparatus and method for electrode foil | |
KR20130049375A | Method of calibrating marking for laser marking system | |
KR20120007616A | Galvanometer scanner controller for laser processing apparatus | |
KR20120007619A | A laser marking system and method for controlling the same | |
KR20010107810A | Web search system and method |