SUSS MICROTEC PHOTONIC SYSTEMS INC has a total of 26 patent applications. Its first patent ever was published in 2014. It filed its patents most often in United States, EPO (European Patent Office) and Republic of Korea. Its main competitors in its focus markets optics, machine tools and semiconductors are EO TECHNICS CO LTD, JENNINGS DEAN and ORAMIR SEMICONDUCTOR LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 7 | |
#2 | EPO (European Patent Office) | 4 | |
#3 | Republic of Korea | 4 | |
#4 | Taiwan | 4 | |
#5 | China | 3 | |
#6 | WIPO (World Intellectual Property Organization) | 3 | |
#7 | Japan | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Machine tools | |
#3 | Semiconductors |
# | Technology | |
---|---|---|
#1 | Soldering, welding and flame cutting | |
#2 | Semiconductor devices | |
#3 | Photomechanical semiconductor production | |
#4 | Optical systems | |
#5 | Cameras |
# | Name | Total Patents |
---|---|---|
#1 | Souter Matthew E | 10 |
#2 | Polomoff Nicholas A | 10 |
#3 | Tessler Christopher L | 10 |
#4 | Erwin Brian M | 10 |
#5 | Hansen Jeff | 9 |
#6 | Ferrari Paul | 9 |
#7 | Yuan Yanrong | 9 |
#8 | Bjorkman John | 7 |
#9 | Hichri Habib | 7 |
#10 | Leenstra Bouwe W | 4 |
Publication | Filing date | Title |
---|---|---|
WO2020198719A1 | Optical distortion reduction in projection systems | |
US2020225454A1 | Optical distortion reduction in projection systems | |
US2020312713A1 | Microstructuring for electroplating processes | |
US2018364463A1 | Magnification compensation and/or beam steering in optical systems | |
US2017170003A1 | Sacrificial layer for post-laser debris removal systems | |
US2016184926A1 | Laser ablation system including variable energy beam to minimize etch-stop material damage | |
US2016074968A1 | Laser etching system including mask reticle for multi-depth etching |