| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 7 | |
| #2 | EPO (European Patent Office) | 5 | |
| #3 | France | 5 | |
| #4 | WIPO (World Intellectual Property Organization) | 5 | |
| #5 | Australia | 1 |
| # | Industry | |
|---|---|---|
| #1 | Measurement | |
| #2 | Optics | |
| #3 | Electrical machinery and energy | |
| #4 | Audio-visual technology | |
| #5 | Chemical engineering | |
| #6 | Semiconductors |
| # | Technology | |
|---|---|---|
| #1 | Measuring light | |
| #2 | Optical systems | |
| #3 | Analysing materials | |
| #4 | Plasma technique | |
| #5 | Electric discharge tubes | |
| #6 | Television | |
| #7 | Semiconductor devices | |
| #8 | Measuring length, angles and areas |
| # | Name | Total Patents |
|---|---|---|
| #1 | Da Silva Edouard | 8 |
| #2 | Ukon Juichiro | 6 |
| #3 | Leclercq Michel | 4 |
| #4 | Delhaye Michel | 3 |
| #5 | Lepere Didier | 3 |
| #6 | Drevillon Bernard | 3 |
| #7 | Roussel Bernard | 3 |
| #8 | Benferhat Ramdane | 2 |
| #9 | Andrieu Philippe | 2 |
| #10 | Chapon Patrick | 2 |
| Publication | Filing date | Title |
|---|---|---|
| FR2821206A1 | Operating method for an optical analysis machine for microstructure wafers, suitable machine | |
| EP1205962A1 | Method for monitoring and/or controlling the status of a plasma in a plasma spectrometer and spectrometer for implementing such a method | |
| FR2814548A1 | Optical light diffraction method, corresponding optical system and device | |
| FR2813955A1 | Method, dipositive and system for detection of a raman spectrum | |
| FR2810732A1 | Spectroscopic measurement method with improved spectral definition | |
| FR2810186A1 | Imaging device comprising a matrix of photodetectors, spectroscopy systems and imaging method thereof |