INSTR SA INC has a total of 12 patent applications. Its first patent ever was published in 1992. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Japan. Its main competitors in its focus markets measurement, optics and electrical machinery and energy are JOBIN YVON SAS, NANOPHOTON CORP and NANO PHOTON KK.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 9 | |
#2 | WIPO (World Intellectual Property Organization) | 2 | |
#3 | Japan | 1 |
# | Industry | |
---|---|---|
#1 | Measurement | |
#2 | Optics | |
#3 | Electrical machinery and energy | |
#4 | Medical technology | |
#5 | Machine tools |
# | Technology | |
---|---|---|
#1 | Measuring light | |
#2 | Optical systems | |
#3 | Analysing materials | |
#4 | Presses | |
#5 | Diagnosis and surgery | |
#6 | Lighting device details |
# | Name | Total Patents |
---|---|---|
#1 | Vezard Nicolas | 4 |
#2 | Chau Chiu | 3 |
#3 | Purcell Francis J | 2 |
#4 | Katzenberger Joseph K | 1 |
#5 | Jiang Wu | 1 |
#6 | Kollias Nikiforos | 1 |
#7 | Millet Viviane D | 1 |
#8 | Slutter Warren S | 1 |
#9 | Marcovecchio Joseph | 1 |
#10 | Laude Jean-Pierre | 1 |
Publication | Filing date | Title |
---|---|---|
JPH10293062A | Improved concentric spectrograph, method for dispersing light, and method for diffracting two beams | |
US5589717A | Compact spectrum analyzer module | |
US5581356A | High purity tunable forensic light source | |
US5640957A | Ultraviolet radiation protection evaluator | |
WO9530179A1 | A method of forming a holographic diffraction grating | |
WO9528632A1 | High purity tunable forensic light source | |
US5613752A | Tunable high intensity forensic light | |
US5455674A | Method and apparatus for forensic examination of surfaces | |
US5515162A | Low noise light source for forensic examination | |
US5371586A | Low aberration diffraction grating system |