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HOLOGRAPHIC LITHOGRAPHY SYSTEM

Overview
  • Total Patents
    12
About

HOLOGRAPHIC LITHOGRAPHY SYSTEM has a total of 12 patent applications. Its first patent ever was published in 1997. It filed its patents most often in Australia, WIPO (World Intellectual Property Organization) and EPO (European Patent Office). Its main competitors in its focus markets optics and electrical machinery and energy are EULITHA A G, SVG LITHOGRAPHY SYSTEMS INC and ASML HOLDING NV.

Patent filings per year

Chart showing HOLOGRAPHIC LITHOGRAPHY SYSTEMs patent filings per year from 1900 to 2020

Focus industries

Top inventors

# Name Total Patents
#1 Hobbs Douglas S 10
#2 Hobbs Douglas C 2
#3 Kelsey Adam F 2
#4 Macleod Bruce D 2

Latest patents

Publication Filing date Title
TW460758B A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material
AU3222397A Process for modulating interferometric lithography patterns to record selected discrete patterns in photoresist
US6088505A Holographic patterning method and tool for production environments