HOLOGRAPHIC LITHOGRAPHY SYSTEM has a total of 12 patent applications. Its first patent ever was published in 1997. It filed its patents most often in Australia, WIPO (World Intellectual Property Organization) and EPO (European Patent Office). Its main competitors in its focus markets optics and electrical machinery and energy are EULITHA A G, SVG LITHOGRAPHY SYSTEMS INC and ASML HOLDING NV.
# | Country | Total Patents | |
---|---|---|---|
#1 | Australia | 3 | |
#2 | WIPO (World Intellectual Property Organization) | 3 | |
#3 | EPO (European Patent Office) | 2 | |
#4 | Republic of Korea | 2 | |
#5 | Taiwan | 1 | |
#6 | United States | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Electrical machinery and energy |
# | Technology | |
---|---|---|
#1 | Photomechanical semiconductor production | |
#2 | Optical systems | |
#3 | Holographic processes | |
#4 | Electric discharge tubes |
# | Name | Total Patents |
---|---|---|
#1 | Hobbs Douglas S | 10 |
#2 | Hobbs Douglas C | 2 |
#3 | Kelsey Adam F | 2 |
#4 | Macleod Bruce D | 2 |
Publication | Filing date | Title |
---|---|---|
TW460758B | A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material | |
AU3222397A | Process for modulating interferometric lithography patterns to record selected discrete patterns in photoresist | |
US6088505A | Holographic patterning method and tool for production environments |