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Integrated circuits with improved spacers and methods for fabricating same
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Methods for fabricating high carrier mobility finfet structures
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Stress enhanced CMOS circuits and methods for their manufacture
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Replacement gate FinFET structures with high mobility channel
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Methods of performing highly tilted halo implantation processes on semiconductor devices
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Processes for preparing stressed semiconductor wafers and for preparing devices including the stressed semiconductor wafers
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Methods of forming features on an integrated circuit product using a novel compound sidewall image transfer technique
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Methods for fabricating MOS devices with stress memorization
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Transistor with stress enhanced channel and methods for fabrication
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In situ doping and diffusionless annealing of embedded stressor regions in PMOS and NMOS devices
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Methods of making transistor devices with elevated source/drain regions to accommodate consumption during metal silicide formation process
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Semiconductor device with strain-inducing regions and method thereof
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Methods for the fabrication of integrated circuits including back-etching of raised conductive structures
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Integrated circuits formed on strained substrates and including relaxed buffer layers and methods for the manufacture thereof
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Canyon gate transistor and methods for its fabrication
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Methods of Forming Source/Drain Regions on Transistor Devices
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Strained semiconductor devices having asymmetrical heterojunction structures and methods for the fabrication thereof
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Methods and Systems for Forming Implanted Doped Regions for a Semiconductor Device Using Reduced Temperature Ion Implantation
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Methods of Forming Highly Scaled Semiconductor Devices Using a Reduced Number of Spacers
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