US2017108688A1
|
|
Optical system for use with microscope
|
US2017108377A1
|
|
Determining focus condition in spectral reflectance system
|
US2013250294A1
|
|
Automatic real-time wavelength calibration of fiber-optic-based spectrometers
|
US2013258333A1
|
|
Correction of second-order diffraction effects in fiber-optic-based spectrometers
|
WO2013109612A1
|
|
High-lifetime broadband light source for low-power applications
|
WO2011088011A1
|
|
Fiber-based optical probe with decreased sample-positioning sensitivity
|
US2008180684A1
|
|
Thin-film metrology using spectral reflectance with an intermediate in-line reference
|
WO2006078471A2
|
|
Determining wafer orientation in spectral imaging
|
US2006164657A1
|
|
Determining wafer orientation in spectral imaging
|
WO2006071651A2
|
|
Spectral imaging of substrates
|
WO2006014263A2
|
|
Method and apparatus for high-speed thickness mapping of patterned thin films
|
WO2005083352A1
|
|
Method and apparatus for high-speed thickness mapping of patterned thin films
|
EP1622743A2
|
|
Whole-substrate spectral imaging system for cmp
|
US7095511B2
|
|
Method and apparatus for high-speed thickness mapping of patterned thin films
|
US6184985B1
|
|
Spectrometer configured to provide simultaneous multiple intensity spectra from independent light sources
|
US6172756B1
|
|
Rapid and accurate end point detection in a noisy environment
|
US6204922B1
|
|
Rapid and accurate thin film measurement of individual layers in a multi-layered or patterned sample
|