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ENTHONE OMI INC

Overview
  • Total Patents
    199
About

ENTHONE OMI INC has a total of 199 patent applications. Its first patent ever was published in 1990. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Australia. Its main competitors in its focus markets surface technology and coating, audio-visual technology and semiconductors are JAPAN PURE CHEMICAL CO LTD, UYEMURA C & CO LTD and ROHM & HAAS DENSHI ZAIRYO KK.

Patent filings per year

Chart showing ENTHONE OMI INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Martin Sylvia 24
#2 Conrod Jay B 10
#3 Commander John H 9
#4 Cacciatore Patricia A 9
#5 Waldman Victor J 8
#6 Hendriks Jan J M 7
#7 Naruskevicius Leonas 7
#8 Pies Peter 7
#9 Nebeker Neil 6
#10 Hurtubise Richard W 6

Latest patents

Publication Filing date Title
AU1755001A Process for the extended use of electrolytes
WO0116404A1 Method for enhanced selective plating of non-uniform objects by lowering the distribution factor
WO0105518A1 Process for plating plastics using a catalytic filler
EP1103637A1 Method of producing AuCuGa alloy coating using electrolysis, and alloys produced by such a method
AU1243300A Process for metallizing a plastic surface
LT99124A Process for obtaining electrical conductive coatings on dielectric surface
LT98161A Process for obtaining electrical conductive coating on dielectric surface
US6054037A Halogen additives for alkaline copper use for plating zinc die castings
US5928435A Method for removing organic coatings from substrates using carboxylic acids, organic solvents, and corrosion inhibitors
US6013203A Coatings for EMI/RFI shielding
US6183622B1 Ductility additives for electrorefining and electrowinning
US6080447A Low etch alkaline zincate composition and process for zincating aluminum
US6045682A Ductility agents for nickel-tungsten alloys
US6024856A Copper metallization of silicon wafers using insoluble anodes
US5853556A Use of hydroxy carboxylic acids as ductilizers for electroplating nickel-tungsten alloys
WO9728053A1 Soft pack package and dispensing system for liquid photoimageable solder mask
CA2235408A1 Electroplating processes compositions and deposits
US5998237A Method for adding layers to a PWB which yields high levels of copper to dielectric adhesion
US5733429A Polyacrylic acid additives for copper electrorefining and electrowinning
CA2178146A1 Electroless nickel cobalt phosphorous composition and plating process