CHUMAKOV DMYTRO has a total of 17 patent applications. Its first patent ever was published in 2010. It filed its patents most often in United States. Its main competitors in its focus markets semiconductors, measurement and micro-structure and nano-technology are FRANK MARTIN M, JEON WOO CHUL and CEA STEPHEN M.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 17 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Measurement | |
#3 | Micro-structure and nano-technology |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Nanostructure applications | |
#3 | Measuring length, angles and areas | |
#4 | Analysing materials |
# | Name | Total Patents |
---|---|---|
#1 | Chumakov Dmytro | 17 |
#2 | Baars Peter | 3 |
#3 | Hetzer Petra | 2 |
#4 | Hertzsch Tino | 2 |
#5 | Grimm Volker | 1 |
#6 | Berthold Heike | 1 |
#7 | Grillberger Michael | 1 |
#8 | Reiche Katrin | 1 |
#9 | Utess Dirk | 1 |
#10 | Buchholtz Wolfgang | 1 |
Publication | Filing date | Title |
---|---|---|
US2013001654A1 | Mask-based silicidation for FEOL defectivity reduction and yield boost | |
US2012270342A1 | In-situ measurement of feature dimensions | |
US2012244710A1 | Shrinkage of critical dimensions in a semiconductor device by selective growth of a mask material | |
US8236645B1 | Integrated circuits having place-efficient capacitors and methods for fabricating the same | |
US2012193807A1 | DRAM cell based on conductive nanochannel plate | |
US2012164836A1 | Integrated circuit fabrication methods utilizing embedded hardmask layers for high resolution patterning | |
US2012122249A1 | Dopant marker for precise recess control |