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CENTROTHERM PHOTOVOLTAICS AG

Overview
  • Total Patents
    206
  • GoodIP Patent Rank
    25,355
  • Filing trend
    ⇩ 100.0%
About

CENTROTHERM PHOTOVOLTAICS AG has a total of 206 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2004. It filed its patents most often in Germany, WIPO (World Intellectual Property Organization) and EPO (European Patent Office). Its main competitors in its focus markets semiconductors, environmental technology and surface technology and coating are JUSUNG ENG CO LTD, PST CO LTD and TALIANI CARLO.

Patent filings per year

Chart showing CENTROTHERM PHOTOVOLTAICS AGs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Hartung Robert Michael 37
#2 Teppe Andreas 32
#3 Schmid Dieter 30
#4 Lerch Wilfried 30
#5 Lenz Reinhard 27
#6 Muenzer Adolf 21
#7 Koetschau Immo 19
#8 Wanka Harald 18
#9 Geiger Matthias 18
#10 Keller Steffen 17

Latest patents

Publication Filing date Title
CN110491949A A kind of solar battery overlayer passivation structure and preparation method thereof and battery
DE102017206612A1 Method and device for forming a layer on a semiconductor substrate and semiconductor substrate
DE102017000429A1 Process oven with oven modules
DE102015016002A1 Method and device for the thermal treatment of substrates and receiving unit for substrates
DE102015014903A1 Wafer boat and plasma treatment device for wafers
DE102015004352A1 Wafer boat and wafer processing device
DE102015004430A1 Apparatus and method for plasma treatment of wafers
DE102015004419A1 Wafer boat and plasma treatment device for wafers
DE102015004414A1 Plasma treatment apparatus for wafers
CN106030778A Wafer boat
DE102014110248A1 Method for marking semiconductor wafers and semiconductor wafer
CN105453249A Retainer, method for producing same and use thereof
DE102014004728A1 Apparatus and method for soldering joining partners
DE102013020899A1 Method for introducing a process gas into a process space for a plasma-assisted chemical vapor deposition and apparatus for a plasma-assisted chemical vapor deposition
DE102013018533A1 A method for reducing the surface roughness of a semiconductor material surface of a substrate having 3-D structures
DE102013014147A1 METHOD AND DEVICE FOR DETECTING A PLASMA IGNITION
DE102013009925A1 Measuring object, method for producing the same and apparatus for the thermal treatment of substrates
DE102012022067A1 SUBSTRATE HOLDER, AND A DEVICE AND METHOD FOR THE TREATMENT OF SUBSTRATES
WO2012127303A1 Barrier for a continuous annealing furnace
WO2012127305A1 Gas supply for a processing furnace