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CENSOR PATENT VERSUCH

Overview
  • Total Patents
    67
About

CENSOR PATENT VERSUCH has a total of 67 patent applications. Its first patent ever was published in 1954. It filed its patents most often in Germany, United States and Japan. Its main competitors in its focus markets optics, machines and semiconductors are NSK TECHNOLOGY CO LTD, PKL CO LTD and S&S TECH CO LTD.

Patent filings per year

Chart showing CENSOR PATENT VERSUCHs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Mayer Herbert E 16
#2 Mayer Herbert Dipl Phys 6
#3 Loebach Ernst Dr 4
#4 Loebach Ernst W 4
#5 Heruberuto Ee Meieru 3
#6 Erunsuto Reebatsuha 3
#7 Sawatzki Harry 3
#8 Mayer Herbert E Dipl Phys 2
#9 Goller Walter 2
#10 Karl Max Harder 2

Latest patents

Publication Filing date Title
JPS60219742A Device for attenuating motion of mass and circuit printing machine
JPS5918950A Apparatus for projection transfer of mask on work piece and adjusting method thereof
DE3318980A1 DEVICE FOR PROJECT COPYING MASKS ONTO A WORKPIECE
JPS59159530A Photoprinting method and semiconductor substrate used for same method
DE3306999A1 Fixture for clamping a workpiece
DE3305281A1 Method of projection copying masks onto a workpiece
DE3239829A1 DEVICE FOR PROJECT COPYING MASKS ONTO A WORKPIECE
US4461567A Method of and apparatus for the positioning of disk-shaped workpieces, particularly semiconductor wafers
JPS5950518A Project printing method
DE3231447A1 Method for projection copying of masks onto a workpiece
US4473292A Dampening system
JPS57145326A Method and device for forming pattern on wafer by photosensing semiconductor wafer
US4449650A Metering pump especially for volatile materials
WO8201482A1 Method and installation for the processing of the upper side of a flat part by means of a liquid
US4405229A Method of projecting printing on semiconductor substrate and workpiece including such substrate
US4390273A Projection mask as well as a method and apparatus for the embedding thereof and projection printing system
US4376581A Method of positioning disk-shaped workpieces, preferably semiconductor wafers
US4355892A Method for the projection printing
DE3038810A1 Optical inhomogeneities removed from support glass of photomask - used in producing photolacquer image on semiconductors
JPS55166924A Method and apparatus for projecting and printing mask on fabricated article