Coated plastic substrate, organic electric element, and manufacturing method of coated plastic substrate
KR20140120298A
Multiple coating device for strip substrates and strip substrate vacuum coating apparatus
DE102013108994A1
Method for setting process gas flow to elongated magnetron, involves determining plasma stoichiometry in each plasma zone segment for each partial process gas flow, and setting flow of process gas portion per sub-process gas flow
DE102013107458A1
Pass substrate treatment plant
DE102013106828B3
Plant chamber of a continuous substrate treatment plant and method for its evacuation
DE102013106736B3
Transport roller and transport device for a horizontal continuous substrate treatment plant
DE102013106735A1
Vacuum chamber of a continuous substrate treatment plant and method for its operation
WO2013190141A1
Method and device for pretreating a coated or uncoated substrate
DE102013105617A1
Planar magnetron arrangement has target, holding device for holding target and cover, where cover is provided for covering holding device partially, and target has zinc or zinc compound
DE102013209009B3
Strip substrate processing system comprises conditioning chamber, rotary drum in chamber having cylindrical surface area for guiding strip substrate by partial circumference around the circumferential surface, and a coating device
DE102013208118A1
Arrangement for reactive magnetron sputtering of moving substrate in vacuum continuous coating installation, sets distance ratio of reactive gas channel of racetrack half fitting directly and more distant racetrack half to preset value
DE102013207319A1
Tape valve in vacuum chamber for roll-to-roll coating system, has drive device that is removed from housing and is operatively connected with vertical shaft using an actuating element which is operatively connected to valve slider
DE102013104086B3
Electron beam evaporation assembly and method of electron beam evaporation
DE102013103875B3
lifting device
DE102013103762A1
coating arrangement
DE102013206474A1
Sputtering method for locally differentiable vaporization of substrates of transfer mask, involves heating absorbing and evaporation layers to a temperature below melting, evaporation or sublimation temperature of evaporation material
DE102013206483A1
Transfer mask for local vaporization of substrates, has heat accumulator that is formed through absorber layer and/or additional heat accumulator layer which is arranged over absorber layer
DE102013206484A1
Transfer mask for structured vapor deposition of substrates, comprises transparent intermediate support, on rear face of which stack of layers having absorber layer of radiation-absorbing material, is arranged and continuous cover layer
DE102013102851A1
Target for a physical vapor deposition process, target assembly and sputter coating assembly
