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ALLIED INTEGRATED PATTERNING C

Overview
  • Total Patents
    16
About

ALLIED INTEGRATED PATTERNING C has a total of 16 patent applications. Its first patent ever was published in 2004. It filed its patents most often in Republic of Korea, China and Taiwan. Its main competitors in its focus markets optics, surface technology and coating and semiconductors are S & AMP STECH CO LTD, ULVAC SEIMAKU KK and PKL CO LTD.

Patent filings in countries

World map showing ALLIED INTEGRATED PATTERNING Cs patent filings in countries
# Country Total Patents
#1 Republic of Korea 5
#2 China 4
#3 Taiwan 4
#4 United States 2
#5 Japan 1

Patent filings per year

Chart showing ALLIED INTEGRATED PATTERNING Cs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Tsai Robert Chin Fu 5
#2 Ho Ming-Feng 4
#3 Ho Ming Feng 3
#4 Chen Hua Jen 2
#5 He Mingfeng Zhang 1
#6 He Mingfeng Chen 1
#7 Chang I-Wen 1
#8 Fu Tsai Robert Chin 1
#9 Chang I Wen 1
#10 Chen Hua-Jen 1

Latest patents

Publication Filing date Title
US2008182179A1 Gray tone mask and method for manufacturing the same
CN1828857A Method for detecting optical mask fault
KR20060086621A Method and system for measuring critical dimensions of a mask design pattern
KR20060025103A Method for making chrome photo mask
KR20060060245A Method and system for online real-time query about current status of optical component
KR20060060265A Method of inspecting mask detects
TW200617587A Method for inspecting mask defects
CN1770152A Method and system for online real-time query of present state of an optical assembly
TW200609774A Method and system for online real-time query about current status of optical component
CN1690847A Method for acceptable defect location for large size light mask substrate and production of light mask
TW200534037A Acceptable defect positioning and manufacturing method for large-scaled photomask blanks