Cooler for plasma generation chamber of euv radiation source
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Optical polarizer and optical system with such a polarizer
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Optical imaging device and imaging method for microscopy
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Reflective optical element for grazing incidence in the EUV wavelength range
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Actuator for optical assembly used for inspecting semiconductor wafer manufacturing process, has actuating object that is partially encased in bellows made of elastomer, in gastight manner
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Polarizer arrangement for spatially separating polarization states of a light beam
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Beam reverser module and optical power amplifier having such a beam reverser module
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Collector mirror unit for extreme ultraviolet lithography, has collector mirror for reflection of electromagnetic radiation emitted by plasma source, where reference surfaces are aligned with respect to specific point in space
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Optical element with a coating and method for checking the optical element
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Method for repairing optical elements and optical element
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Optical element
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Method for manufacturing optic element e.g. lens, in UV wavelength range, involves attaching porous layer by commonly applying two inorganic materials, and removing one of materials so that pores are formed in unremoved material
DE102011102588A1
Optical arrangement for transforming an incident light beam, method for converting a light beam to a line focus and optical device therefor
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Method for producing a reflective optical component for an EUV projection exposure apparatus and such a component
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Optical device for semiconductor wafer inspection system, has reflective elements with transparent elements having reflective surfaces which are boundary surfaces, where light beam is totally reflected at boundary surface
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Optical arrangement for an EUV projection exposure apparatus and method for cooling an optical component
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Optical system for generating illumination line in machining plane from light beam of wavelength, comprises gap, illumination optic for illuminating gap, and imaging optical system for imaging gap in illumination line into machining plane
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Metrology module for laser system
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Device for determining divergence and/or wave front curvature of laser ray bundle in laser crystallization device, has determination device determining divergence and/or wave front curvature of ray bundle from evaluated local expansion
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Optical system for generating a line focus and apparatus for treating a substrate with such an optical system
