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MICROLAS LASERSYSTEM GMBH

Overview
  • Total Patents
    23
About

MICROLAS LASERSYSTEM GMBH has a total of 23 patent applications. Its first patent ever was published in 1992. It filed its patents most often in Germany, Japan and United States. Its main competitors in its focus markets optics, machine tools and semiconductors are LIMO PATENTVERWALTUNG GMBH, HIGHYAG LASERTECHNOLOGIE GMBH and XMR INC.

Patent filings in countries

World map showing MICROLAS LASERSYSTEM GMBHs patent filings in countries
# Country Total Patents
#1 Germany 12
#2 Japan 6
#3 United States 4
#4 EPO (European Patent Office) 1

Patent filings per year

Chart showing MICROLAS LASERSYSTEM GMBHs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kahlert Hans-Juergen Dr 13
#2 Kahlert Hans-Juergen 7
#3 Burghardt Berthold Dr 7
#4 Burghardt Berthold 6
#5 Brunwinkel Klaus 3
#6 Schmidt Henning Dr 2
#7 Stopka Michael 2
#8 Simon Frank 2
#9 Sarbach Uwe 1
#10 Faulenbach Udo 1

Latest patents

Publication Filing date Title
DE10301482A1 Process and device to crystallize amorphous semiconductor especially amorphous silicon layers uses at least two successive melting radiation pulses separated by one microsecond
DE10250926A1 Laser system which combines beams of two or more lasers, has beams directed onto beam splitter and mirror, so that reflected radiation passes through beam splitter and back to resonator
DE10226890A1 Gas discharge laser, such as excimer laser or molecular fluorine laser, has e.g. adjustable diverging lens and converging lens in resonator to compensate for thermal lens effect
DE10049557A1 Device for converting the intensity distribution of a laser beam
DE19915000A1 Device and method for controlling the intensity distribution of a laser beam
DE19632460C1 Optical device for homogenisation of laser radiation
DE19630739C1 Producing mask for laser radiation
DE19630743A1 Device for imaging laser radiation on a substrate
DE19630607C1 Laser beam energy or its distribution monitoring device
DE19533314A1 Imaging optics for the imaging of a light beam
DE19520187C1 Optical system for excimer laser
DE4238826C1 Traversing beam high vacuum irradiation chamber - having minimal area beam inlet window and internal beam location device