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YAMAGUCHI SEIKEN KOGYO KK

Overview
  • Total Patents
    50
  • GoodIP Patent Rank
    50,335
  • Filing trend
    ⇩ 50.0%
About

YAMAGUCHI SEIKEN KOGYO KK has a total of 50 patent applications. It decreased the IP activity by 50.0%. Its first patent ever was published in 1999. It filed its patents most often in Japan, Taiwan and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets basic materials chemistry, audio-visual technology and machine tools are YAMAGUCHI SEIKEN KOGYO CO LTD, SHIN A T&C and SUN ANSHUN.

Patent filings in countries

World map showing YAMAGUCHI SEIKEN KOGYO KKs patent filings in countries
# Country Total Patents
#1 Japan 46
#2 Taiwan 2
#3 WIPO (World Intellectual Property Organization) 2

Patent filings per year

Chart showing YAMAGUCHI SEIKEN KOGYO KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Yamaguchi Yoshinobu 13
#2 Ando Junichiro 13
#3 Kato Nobukatsu 12
#4 Naito Kenji 6
#5 Iwata Toru 6
#6 Hayashi Yoshiki 5
#7 Sugawa Satoshi 4
#8 Kawahara Akihiro 4
#9 Haraguchi Tetsuro 4
#10 Horimoto Sanaki 4

Latest patents

Publication Filing date Title
JP2020170578A Polishing method of magnetic disk substrate
JP2020170748A Abrasive composition for aluminum nitride substrate and method for polishing aluminum nitride substrate
JP2020119620A Polishing agent composition for magnetic disk substrate
JP2020119619A Polishing agent composition for magnetic disk substrate
JP2020071890A Polishing agent composition for magnetic disk substrate
JP2020021527A Polishing agent composition for magnetic disk substrate
JP2020021528A Method for polishing magnetic disk substrate and polishing agent composition for magnetic disk substrate
JP2019079583A Polishing agent composition for magnetic disk substrate
JP2019077764A Abrasive composition for magnetic disk substrate
JP2019016417A Polishing agent composition for magnetic disk substrate
JP2019008846A Polishing agent composition for magnetic disk substrate
JP2018159033A Polishing agent composition for aluminum nitride substrate and polishing method of aluminum nitride substrate
JP2018160304A Polishing agent composition for magnetic disk substrate
JP2018070719A Abrasive composition for sapphire substrate
JP2018067591A Polishing agent composition for nitride semiconductor substrate
JP2018032785A Polishing composition for silicon carbide substrate
JP2018032784A Polishing composition for silicon carbide substrate
JP2018032450A Polisher composition for magnetic disk substrates
JP2017218514A Polishing agent composition
JP2017204313A Polisher composition for magnetic disk substrate