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WILL BE S & T CO LTD

Overview
  • Total Patents
    31
  • GoodIP Patent Rank
    182,323
  • Filing trend
    ⇧ 200.0%
About

WILL BE S & T CO LTD has a total of 31 patent applications. It increased the IP activity by 200.0%. Its first patent ever was published in 1999. It filed its patents most often in Republic of Korea, United States and Taiwan. Its main competitors in its focus markets machine tools, semiconductors and packaging and shipping are INOPLA INC, HANGZHOU SIZONE ELECTRONIC TECH INC and OKAMOTO MACHINE TOOL WORKS.

Patent filings in countries

World map showing WILL BE S & T CO LTDs patent filings in countries

Patent filings per year

Chart showing WILL BE S & T CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Lee Han Ju 13
#2 Lee Jae Bok 9
#3 Kim Jin Woo 6
#4 Kim Min Gyu 5
#5 Yun Jung Rack 4
#6 Lee Jae-Bok 4
#7 Lee Han-Ju 4
#8 Koo Gyo Uk 3
#9 Son So Rip 3
#10 Lee Jun-Je 2

Latest patents

Publication Filing date Title
KR20200024666A Pad assembly of device for transporting substrate
KR20200001365A Retainer ring of chemical and mechanical polishing apparatus
KR20190104696A Retainer ring of chemical and mechanical polishing apparatus
KR20190007298A Pad assembly of device for transporting substrate
KR101675560B1 Retainner Ring of Chemical Mechanical Polishing Apparatus
KR101455311B1 Retainner Ring of Chemical Mechanical Polishing Apparatus
KR20140103512A Contact ring for electro plating apparatus
KR20140103520A Retainner Ring of Chemical Mechanical Polishing Apparatus
KR101313795B1 Metalic pattern for retainner ring of chemical mechanical polishing apparatus
KR101334985B1 Inspection apparatus for retainner ring of chemical mechanical polishing apparatus
KR101003523B1 Retainner ring of chemical mechanical polishing apparatus
KR101003525B1 Manufacturing method for retainner ring of chemical mechanical polishing apparatus
KR20110023143A Joining method for fluoride articles
KR20100137303A Retainer ring of chemical mechanical polishing apparatus
KR20090039123A Retainer ring of chemical mechanical polishing apparatus
KR100872267B1 The wafer toggle roller combination structure
TWI293265B Retainer ring of chemical mechanical polishing device
KR20060131620A Retainer ring of chemical mechanical polishing apparatus
KR20050049443A Auto spin cylinge cleaner (lcd process)
KR20040069448A Substrate drying method and apparatus