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WAVE INC 4

Overview
  • Total Patents
    12
About

WAVE INC 4 has a total of 12 patent applications. Its first patent ever was published in 2001. It filed its patents most often in United States and China. Its main competitors in its focus markets surface technology and coating, electrical machinery and energy and optics are UNAXIS BALZER AG, LEYBOLD OPTICS GMBH and SHIRIPOV VLADIMIR YAKOVLEVICH.

Patent filings in countries

World map showing WAVE INC 4s patent filings in countries
# Country Total Patents
#1 United States 11
#2 China 1

Patent filings per year

Chart showing WAVE INC 4s patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Baldwin David Alan 11
#2 Hylton Todd Lanier 10
#3 Hylton D A Baldwin T L 1
#4 Minnemann Michael Joseph 1

Latest patents

Publication Filing date Title
US2005220416A1 Method for forming an aligned optical sub-assembly
US7316764B2 System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signal
US2003024807A1 System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicals
US2002130031A1 System and method for performing sputter deposition using a divergent ion beam source and a rotating substrate
US2002130040A1 System and method for performing sputter deposition using a devergent ion beam source and a rotating substrate
US6402904B1 System and method for performing sputter deposition using independent ion and electron sources and a target biased with an a-symmetric bi-polar DC pulse signal
US6819871B1 Multi-channel optical filter and multiplexer formed from stacks of thin-film layers
US6402900B1 System and method for performing sputter deposition using ion sources, targets and a substrate arranged about the faces of a cube
US6402901B1 System and method for performing sputter deposition using a spherical geometry
US6402905B1 System and method for controlling deposition thickness using a mask with a shadow that varies along a radius of a substrate