Method for forming an aligned optical sub-assembly
US7316764B2
System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signal
US2003024807A1
System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicals
US2002130031A1
System and method for performing sputter deposition using a divergent ion beam source and a rotating substrate
US2002130040A1
System and method for performing sputter deposition using a devergent ion beam source and a rotating substrate
US6402904B1
System and method for performing sputter deposition using independent ion and electron sources and a target biased with an a-symmetric bi-polar DC pulse signal
US6819871B1
Multi-channel optical filter and multiplexer formed from stacks of thin-film layers
US6402900B1
System and method for performing sputter deposition using ion sources, targets and a substrate arranged about the faces of a cube
US6402901B1
System and method for performing sputter deposition using a spherical geometry
US6402905B1
System and method for controlling deposition thickness using a mask with a shadow that varies along a radius of a substrate