VRAM TECHNOLOGIES LLC has a total of 25 patent applications. Its first patent ever was published in 1998. It filed its patents most often in Taiwan, United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, basic communication technologies and control are PAKAL TECHNOLOGIES LLC, PENDHARKAR SAMEER P and CHEN WEIZE.
# | Country | Total Patents | |
---|---|---|---|
#1 | Taiwan | 5 | |
#2 | United States | 5 | |
#3 | WIPO (World Intellectual Property Organization) | 4 | |
#4 | Israel | 3 | |
#5 | Australia | 2 | |
#6 | Canada | 2 | |
#7 | China | 2 | |
#8 | Brazil | 1 | |
#9 | EPO (European Patent Office) | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Basic communication technologies | |
#3 | Control | |
#4 | Micro-structure and nano-technology |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Systems for regulating electrical variables | |
#3 | Pulse technique | |
#4 | Making microstructural devices |
# | Name | Total Patents |
---|---|---|
#1 | Metzler Richard A | 20 |
#2 | Metzler Richard | 1 |
#3 | Metzler R A | 1 |
Publication | Filing date | Title |
---|---|---|
AU2002245124A1 | Sidewalls as semiconductor etch stop and diffusion barrier | |
US6537921B2 | Vertical metal oxide silicon field effect semiconductor diodes | |
US6580150B1 | Vertical junction field effect semiconductor diodes | |
US6667237B1 | Method and apparatus for patterning fine dimensions | |
US6433370B1 | Method and apparatus for cylindrical semiconductor diodes | |
US6420757B1 | Semiconductor diodes having low forward conduction voltage drop, low reverse current leakage, and high avalanche energy capability | |
IL130973D0 | Semiconductor diodes having low forward conduction voltage drop and low reverse current leakage |