| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 15 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Measurement | |
| #3 | Electrical machinery and energy | |
| #4 | Semiconductors | |
| #5 | Control | |
| #6 | Machine tools | |
| #7 | Machines |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Cameras | |
| #3 | Analysing materials | |
| #4 | Teaching materials | |
| #5 | Rolling metal | |
| #6 | Optical systems | |
| #7 | Semiconductor devices | |
| #8 | Electric discharge tubes | |
| #9 | Unspecified technologies | |
| #10 | Testing of structures |
| # | Name | Total Patents |
|---|---|---|
| #1 | Van De Kerkhof Marcus Adrianus | 15 |
| #2 | Moest Bearrach | 3 |
| #3 | Van Der Schaar Maurits | 3 |
| #4 | Janssen Franciscus Johannes Joseph | 2 |
| #5 | Kok Haico Victor | 2 |
| #6 | Fuchs Andreas | 2 |
| #7 | Uitterdijk Tammo | 2 |
| #8 | Verstappen Leonardus Henricus Marie | 2 |
| #9 | Beckers Marcel | 2 |
| #10 | Bruijstens Jeroen Peter Johannes | 2 |
| Publication | Filing date | Title |
|---|---|---|
| US2011043775A1 | Lithographic apparatus, distortion determining method, and patterning device | |
| US2010149507A1 | Dedicated metrology stage for lithography applications | |
| US2011200246A1 | Method of measuring overlay error and a device manufacturing method |