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JPH0439660A
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Substrate for photomask material, photomask material, and manufacture of them
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JPH042768A
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Plasma electron beam heating apparatus
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JPH03158457A
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Method and device for heating evaporating source by plasma electron beam
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JPH0375359A
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Formation of sulfide-type optical film by using plasma electron beam
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JPH0375358A
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Formation of thin film of fluoride or its mixture by using plasma electron beam
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JPH0364456A
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Heater with plasma electron beam
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JPH01263272A
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Magnetron type sputtering device
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JPH01260792A
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Device for heating plasma electron beam
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JPS6468470A
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Plasma electron beam heating source
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JPS62234163A
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Photomask and its production
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JPS62229152A
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Photomask and its production
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JPS62284074A
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Continuous sputtering device
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JPS6276633A
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Method for evaluation of cleaning performance in high-pressure water spray cleaning, brush-scrubber cleaning, supersonic cleaning and the like
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JPS61267054A
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Etching method for photomask blank
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JPS60107651A
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Photomask
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JPS58185454A
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Glass base plate for hard mask
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JPS5859024A
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Apparatus for bonding thin film
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JPS5822377A
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Formation of heterogeneous optical thin film by two-source vapor deposition
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JPS5822376A
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Formation of heterogeneous optical thin film by reaction vapor deposition
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JPS57175847A
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Manufacture of selective absorption film for solar heat collection
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