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TOSOH SMD INC

Overview
  • Total Patents
    245
  • GoodIP Patent Rank
    29,745
  • Filing trend
    ⇩ 57.0%
About

TOSOH SMD INC has a total of 245 patent applications. It decreased the IP activity by 57.0%. Its first patent ever was published in 1987. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Republic of Korea. Its main competitors in its focus markets surface technology and coating, electrical machinery and energy and materials and metallurgy are BERNHARD BERGHAUS, GLOBAL MATERIAL SCIENCE CO LTD and MILLER STEVEN A.

Patent filings per year

Chart showing TOSOH SMD INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Ivanov Eugene Y 123
#2 Smathers David B 55
#3 Bailey Robert S 31
#4 Leybovich Alexander 26
#5 Yuan Yongwen 25
#6 Theado Erich 20
#7 Conard Harry W 17
#8 Miao Weifang 16
#9 Holcomb Melvin K 16
#10 Poole John E 14

Latest patents

Publication Filing date Title
US2019161850A1 Ultra-fine grain size tantalum sputtering targets with improved voltage performance and methods thereby
US2019084048A1 Titanium-tantalum powders for additive manufacturing
US2018374690A1 Method of production of uniform metal plates and sputtering targets made thereby
US2020010368A1 Magnesium oxide sputtering target and method of making same
US2020332410A1 Tungsten-boron sputter targets and films made thereby
TW201738395A Method of making a tantalum sputtering target with increased deposition rate
TW201730360A Low resistivity tungsten film and tungsten target with improved characteristics
US2016298228A1 Soft-magnetic based targets having improved pass through flux
WO2016164269A1 Method of making a tantalum sputter target and sputter targets made thereby
KR20170126483A A sputtering target with a reverse bowing target geometry
TW201544615A Radio frequency identification in-metal installation and isolation for sputtering target
TW201542847A Boron doped N-type silicon target
WO2015061035A1 Optimized textured surfaces and methods of optimizing
TW201435117A Silicon sputtering target with enhanced surface profile and improved performance and methods of making the same
KR20140129018A Low deflection sputtering target assembly and methods of making same
CN103917685A Silicon sputtering target with special surface treatment and good particle performance and methods of making the same
CN103492608A Diffusion-bonded sputtering target assembly and method of manufacturing
TW201207139A Bimetallic rotary target
US2011203921A1 Method of bonding rotatable ceramic targets to a backing structure
CN102844460A Sputter target