| # | Country | Total Patents | |
|---|---|---|---|
| #1 | China | 3 | |
| #2 | EPO (European Patent Office) | 3 | |
| #3 | Taiwan | 3 | |
| #4 | WIPO (World Intellectual Property Organization) | 3 | |
| #5 | Republic of Korea | 2 | |
| #6 | Australia | 1 |
| # | Industry | |
|---|---|---|
| #1 | Measurement | |
| #2 | Optics |
| # | Technology | |
|---|---|---|
| #1 | Measuring light | |
| #2 | Analysing materials | |
| #3 | Devices using light amplification |
| # | Name | Total Patents |
|---|---|---|
| #1 | Yan Wen-Bin | 9 |
| #2 | Krusen Calvin R | 6 |
| #3 | Augustine Robert | 4 |
| #4 | Wang Chuji | 4 |
| #5 | Bin Yan Wen | 2 |
| #6 | Yan Wen Bin | 2 |
| #7 | Chuji Wang | 1 |
| #8 | Robert Augustine | 1 |
| #9 | Wen-Bin Yan | 1 |
| Publication | Filing date | Title |
|---|---|---|
| EP1695051A1 | Apparatus and method for improved analysis of liquids by continuous wave-cavity ring down spectroscopy | |
| TW200526942A | Device and method of trace gas analysis using cavity ring-down spectroscopy | |
| WO2005038436A2 | System and method for cavity ring-down spectroscopy using continuously varying continuous wave excitation | |
| TW200427986A | System and method for measuring trace gases | |
| WO03098173A1 | System and method for controlling a ligth source for cavity ring-down spectroscopy |