SURFACE TECHNOLOGY SYSTEMS PLC has a total of 30 patent applications. Its first patent ever was published in 1997. It filed its patents most often in United States, EPO (European Patent Office) and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, electrical machinery and energy and chemical engineering are SURFACE TECH SYS LTD, SURFACE TECHNOLOGY SYSTEMS LTD and SUZUKI KEN.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 14 | |
#2 | EPO (European Patent Office) | 12 | |
#3 | WIPO (World Intellectual Property Organization) | 3 | |
#4 | Republic of Korea | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Electrical machinery and energy | |
#3 | Chemical engineering | |
#4 | Organic fine chemistry | |
#5 | Materials and metallurgy | |
#6 | Measurement | |
#7 | Micro-structure and nano-technology | |
#8 | Machines |
# | Name | Total Patents |
---|---|---|
#1 | Bhardwaj Jyoti Kiron | 25 |
#2 | Lea Leslie Michael | 18 |
#3 | Hopkins Janet | 6 |
#4 | Ashraf Huma | 6 |
#5 | Hynes Alan Michael | 4 |
#6 | Ryan Martin Edward | 3 |
#7 | Haynes David Mark | 3 |
#8 | Shepherd Nicholas | 3 |
#9 | Guibarra Edward | 3 |
#10 | Khamsehpour Babak | 3 |
Publication | Filing date | Title |
---|---|---|
US6534922B2 | Plasma processing apparatus | |
EP1188180A1 | Improvements relating to plasma etching | |
EP1088329A1 | Method and apparatus for stabilising a plasma | |
EP1084076A1 | Chlorotrifluorine gas generator system | |
EP1055250A1 | Plasma processing apparatus | |
EP1131847A1 | A method for etching a substrate | |
US7141504B1 | Method and apparatus for anisotropic etching | |
US6355181B1 | Method and apparatus for manufacturing a micromechanical device | |
EP1324371A1 | Plasma processing apparatus | |
EP0822582A2 | Method of etching substrates |