| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 4 | |
| #2 | EPO (European Patent Office) | 3 | |
| #3 | Germany | 2 | |
| #4 | United Kingdom | 1 | |
| #5 | WIPO (World Intellectual Property Organization) | 1 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Chemical engineering | |
| #3 | Electrical machinery and energy | |
| #4 | Measurement | |
| #5 | Organic fine chemistry | |
| #6 | Materials and metallurgy |
| # | Name | Total Patents |
|---|---|---|
| #1 | Bhardwaj Jyoti Kiron | 5 |
| #2 | Lea Leslie Michael | 4 |
| #3 | Hynes Alan Michael | 2 |
| #4 | Ashraf Huma | 2 |
| #5 | Hopkins Janet | 2 |
| #6 | Johnston Ian Ronald | 1 |
| #7 | Khamsehpour Babak | 1 |
| #8 | Thomas Tudor Norman | 1 |
| #9 | Brancher Carl David Monnington | 1 |
| #10 | Williams Robert John | 1 |
| Publication | Filing date | Title |
|---|---|---|
| GB0100958D0 | Plasma processing apparatus | |
| US6187685B1 | Method and apparatus for etching a substrate |