SAN EI GIKEN INC has a total of 18 patent applications. Its first patent ever was published in 2005. It filed its patents most often in Japan, Taiwan and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets optics, audio-visual technology and semiconductors are ALTIX, FUOTOPORI OUKA KK and AUTOMA TECH SA.
# | Country | Total Patents | |
---|---|---|---|
#1 | Japan | 16 | |
#2 | Taiwan | 1 | |
#3 | WIPO (World Intellectual Property Organization) | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Audio-visual technology | |
#3 | Semiconductors | |
#4 | Electrical machinery and energy | |
#5 | Surface technology and coating | |
#6 | Machine tools |
# | Technology | |
---|---|---|
#1 | Photomechanical semiconductor production | |
#2 | Semiconductor devices | |
#3 | Casings and printed circuits | |
#4 | Nonlinear optics | |
#5 | Presses | |
#6 | Layered products | |
#7 | Lighting device details |
# | Name | Total Patents |
---|---|---|
#1 | Miyake Takeshi | 13 |
#2 | Takagi Toshihiro | 11 |
#3 | Imanishi Ken | 2 |
#4 | Miyake Ken | 2 |
#5 | Imanishi Masaru | 1 |
#6 | Miyake Eiichi | 1 |
#7 | Kobayashi Kazuhiro | 1 |
Publication | Filing date | Title |
---|---|---|
JP2020170059A | Exposure device and exposure method | |
JP2015123623A | Laminator | |
JP2014190987A | Exposure apparatus and exposure method | |
JP2013257409A | Exposure device and exposure method | |
JP2011081317A | Exposure device and method | |
JP2011002757A | Exposure device | |
JP2010266763A | Exposure apparatus | |
JP2010263101A | Light source | |
JP2010019903A | Exposure apparatus | |
JP2009283857A | Split exposure method and split exposure system | |
JP2009216803A | Exposure apparatus | |
JP2009168935A | Photomask to be used for exposure | |
JP2009038255A | Light source | |
JP2008170775A | Exposure device | |
JP2007164023A | Exposure method and exposure device | |
JP2007121425A | Exposure method and exposure apparatus |