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PRECITEC OPTRONIK GMBH

Overview
  • Total Patents
    130
  • GoodIP Patent Rank
    18,494
  • Filing trend
    0.0%
About

PRECITEC OPTRONIK GMBH has a total of 130 patent applications. It increased the IP activity by 0.0%. Its first patent ever was published in 2004. It filed its patents most often in Germany, United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets measurement, machine tools and semiconductors are PFISTER WALTER, QUEENSGATE INSTR LTD and CARL EDVARD JOHANSSON.

Patent filings per year

Chart showing PRECITEC OPTRONIK GMBHs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Dietz Christoph 56
#2 Schönleber Martin 39
#3 Michelt Berthold 23
#4 Schoenleber Martin 22
#5 Kogel-Hollacher Markus 21
#6 Kunkel Matthias 18
#7 Schonleber Martin 11
#8 Bautze Thibault 10
#9 Fraas Christian 7
#10 Pichot Jean-Francois 6

Latest patents

Publication Filing date Title
DE102019122866A1 Optical measuring device
DE102019121835A1 Method and device for measuring the wall thickness of containers
DE102019118600A1 Phosphor light source for CLS or Multipoint
DE102019116309A1 Method and device for the controlled machining of a workpiece
KR20210021972A Apparatus, and method for colorimetrically-confocal optically measuring and confocal imaging of a measurement object
DE102019114167A1 Optical measuring device and method
DE102019001498A1 Device for optical measurement and mapping of a measurement object and method
DE102018130901A1 Optical measuring device
DE102018114860A1 Device and method for the optical measurement of a measurement object
DE102017126310A1 Distance measuring device
DE102017122689A1 Method and device for non-contact measurement of a distance to a surface or a distance between two surfaces
DE102017122500A1 Distance measuring device
US2018164089A1 Distance measuring device and method for measuring distances
US2018094975A1 Chromatic confocal distance sensor
DE102016005021A1 Method and apparatus for measuring the depth of the vapor capillary during a high energy beam machining process
DE102015118069A1 Measuring device and method for measuring the thickness of a flat sample
DE102015118068B3 Processing apparatus and method for controlled two-sided processing of a semiconductor wafer
DE102015008217A1 Method and device for determining the position and position of an eye
DE102014011569A1 Method for measuring the distance between a workpiece and a machining head of a laser processing device
CN105324629A Optical measuring device for recording differences in distance and optical measuring method