PLASMA CONTROL SYSTEMS LLC has a total of 13 patent applications. Its first patent ever was published in 2002. It filed its patents most often in United States, Canada and China. Its main competitors in its focus markets telecommunications, chemical engineering and electrical machinery and energy are GOTO NAOHISA, WALTER DALLENBACH and COMMUNICATIONS & POWER INDUSTRIES INC.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 3 | |
#2 | Canada | 2 | |
#3 | China | 2 | |
#4 | EPO (European Patent Office) | 2 | |
#5 | Republic of Korea | 2 | |
#6 | WIPO (World Intellectual Property Organization) | 2 |
# | Industry | |
---|---|---|
#1 | Telecommunications | |
#2 | Chemical engineering | |
#3 | Electrical machinery and energy |
# | Technology | |
---|---|---|
#1 | Antennas | |
#2 | Plasma technique | |
#3 | Electric discharge tubes |
# | Name | Total Patents |
---|---|---|
#1 | Pribyl Patrick A | 6 |
#2 | Pribyl Patrick | 5 |
#3 | Patrick Pribyl | 1 |
#4 | Evans John D | 1 |
Publication | Filing date | Title |
---|---|---|
KR20060029621A | Plasma production device and method and rf driver circuit with adjustable duty cycle | |
US7100532B2 | Plasma production device and method and RF driver circuit with adjustable duty cycle | |
US7084832B2 | Plasma production device and method and RF driver circuit with adjustable duty cycle | |
US7132996B2 | Plasma production device and method and RF driver circuit |