| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 8 | |
| #2 | EPO (European Patent Office) | 3 | |
| #3 | Taiwan | 3 | |
| #4 | Japan | 2 | |
| #5 | Republic of Korea | 2 | |
| #6 | WIPO (World Intellectual Property Organization) | 2 | |
| #7 | Australia | 1 |
| # | Industry | |
|---|---|---|
| #1 | Machine tools | |
| #2 | Semiconductors | |
| #3 | Machines | |
| #4 | Control |
| # | Name | Total Patents |
|---|---|---|
| #1 | Sommer Phillip R | 10 |
| #2 | Williams Roger O | 8 |
| #3 | Hoshizaki Jon A | 6 |
| #4 | Lee Lawrence L | 6 |
| #5 | Butterfield Paul D | 4 |
| #6 | Buhler James D | 4 |
| #7 | Paul D Butterfield | 3 |
| #8 | Sommer Phil R | 3 |
| #9 | Reichel Charles A | 3 |
| #10 | Meng Ching-Ling | 3 |
| Publication | Filing date | Title |
|---|---|---|
| AU6887898A | Polishing media magazine for improved polishing | |
| US6196896B1 | Chemical mechanical polisher | |
| US6113479A | Wafer carrier for chemical mechanical planarization polishing | |
| US5899798A | Low profile, low hysteresis force feedback gimbal system for chemical mechanical polishing | |
| US6110025A | Containment ring for substrate carrier apparatus | |
| US5908530A | Apparatus for chemical mechanical polishing |