NEXUS1 CO LTD has a total of 11 patent applications. It increased the IP activity by 100.0%. Its first patent ever was published in 2015. It filed its patents most often in Republic of Korea, China and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, optics and measurement are YOO WOO S, Jinan jingheng electronics co ltd and ACCRETECH USA INC.
# | Country | Total Patents | |
---|---|---|---|
#1 | Republic of Korea | 9 | |
#2 | China | 1 | |
#3 | WIPO (World Intellectual Property Organization) | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Optics | |
#3 | Measurement |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Photomechanical semiconductor production | |
#3 | Analysing materials |
# | Name | Total Patents |
---|---|---|
#1 | Hwang Byoung Moon | 10 |
#2 | Hwang Byoung-Moon | 1 |
#3 | Lee Seung Hun | 1 |
Publication | Filing date | Title |
---|---|---|
KR20200073193A | Apparatus for inspecting edge area of wafer | |
KR20200074928A | System for inspecting edge area of wafer | |
KR20190134275A | System for inspecting edge area of wafer and method using the same | |
KR20190119803A | Apparatus for inspecting edge area of wafer and method using the same | |
KR101863946B1 | Roll To Roll Exposure Control Method | |
KR101869821B1 | Roll To Roll Exposure System | |
KR101606093B1 | Apparatus and method for inspecting defect of substrate | |
KR101569853B1 | Apparatus and method for inspecting defect of substrate | |
KR101595885B1 | Wafer Support Apparatus for Wafer Inspection Machine |