Learn more

MURATA MASAYOSHI

Overview
  • Total Patents
    77
  • GoodIP Patent Rank
    59,031
  • Filing trend
    ⇧ 33.0%
About

MURATA MASAYOSHI has a total of 77 patent applications. It increased the IP activity by 33.0%. Its first patent ever was published in 2003. It filed its patents most often in Japan, WIPO (World Intellectual Property Organization) and EPO (European Patent Office). Its main competitors in its focus markets environmental technology, surface technology and coating and electrical machinery and energy are PLASMA PHYSICS CORP, NISSIN ELECTRIC CO LTD and OVSHINSKY INNOVATION LLC.

Patent filings in countries

World map showing MURATA MASAYOSHIs patent filings in countries

Patent filings per year

Chart showing MURATA MASAYOSHIs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Murata Masayoshi 77
#2 Murata Yasuko 17

Latest patents

Publication Filing date Title
JP2020189172A Air cleaner using plasma
JP2020171777A Air cleaning device using plasma
JP2020163232A Air cleaner with plasma
JP2020025140A Device for forming semiconductor film on both sides of substrate
JP2020006261A Atmospheric pressure plasma sterilizer
JP2019209170A Atmospheric pressure plasma sterilization device
JP2020010694A Atmospheric pressure plasma sterilization apparatus
JP2019186569A Apparatus for forming semiconductor films on both sides of substrate
JP2019165260A Device for forming semiconductor film on both sides of substrate
JP2019112725A Plasma CVD device
JP2019085653A Plasma cvd method, and apparatus using the same
JP2019081960A Plasma cvd device and plasma cvd method
JP2019014976A Catalyst cvd apparatus, catalyst cvd method and method for self-cleaning catalyst cvd apparatus
JP2019011517A Catalyst cvd apparatus and catalyst cvd method
JP2018157236A Tray-less substrate transfer device and film forming device using the same
JP2018121082A Catalyst cvd apparatus and catalyst cvd method
JP2018111887A Catalyst cvd system and catalyst cvd method
JP2018101813A Plasma etching apparatus and plasma etching method
JP2018076604A Plasma CVD apparatus and plasma CVD method
JP2018062713A Plasma CVD apparatus and plasma CVD method