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MICRO LITHOGRAPHY INC

Overview
  • Total Patents
    67
  • GoodIP Patent Rank
    77,525
  • Filing trend
    ⇧ 250.0%
About

MICRO LITHOGRAPHY INC has a total of 67 patent applications. It increased the IP activity by 250.0%. Its first patent ever was published in 1983. It filed its patents most often in Taiwan, United States and EPO (European Patent Office). Its main competitors in its focus markets optics, machines and machine tools are NANOSCRIBE GMBH, CHIYODA GRAVURE PRINTING and DU PONT UK.

Patent filings per year

Chart showing MICRO LITHOGRAPHY INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Wang Ching-Bore 47
#2 Yen Yung-Tsai 14
#3 Bih Qoang Rung 14
#4 Yen Ysung-Tsai 2
#5 Ching-Bore Wang 1
#6 Bih Qoang R 1
#7 Wang Chung-Bore 1

Latest patents

Publication Filing date Title
TWI702646B Wafer cutting particle removal method
TWI707590B Sound film structure to improve bass sound quality
TW202024783A Photomask protective film assembly with moisture absorption and its surface treatment method
TW202020974A Method of reducing generation of photo-mask contaminant and structure thereof avoid sucking dust particles and reducing volatile generated by heat
TWI669565B Photomask protection component structure by which the quantity of residual adhesives is reduced, the exposed thickness of the adhesive is reduced, and the generated haze is also reduced
TWI670562B Photomask protection component structure includes a frame and a protective film attached to the top surface of the frame to reduce the amount of gas overflow and the generation of haze
TW201946702A Mask surface treatment method
TW201938722A DUV photomask protective film aluminum frame adhesive treatment method
TWI649612B Surface treatment method of frame for photomask capable of electroplating a black nickel adhesion layer on the surface of a frame to achieve the purpose of easy cleaning and convenient inspection
TWI644953B Preparation method of DUV photomask frame protective thin film adding a fluoropolymer, a nano diamond and a carbon nanotube in each kilogram of perfluoro solvent
TWI612376B Photomask protection component packing-box at least comprising a base and an upper cover
TWI612369B EUV mask inorganic protective film assembly manufacturing method capable of protecting a carbon nanotube layer and improving structural strength of the carbon nanotube layer
TWI618975B Photomask dustproof frame structure including an upper frame body, a lower frame body, and a shock absorbing and pressure dispersing layer
TWI618974B Dustproof frame structure for photomask being of a structure with a top surface, a bottom surface and four outer wall surfaces
TWI581056B Photomask protection assembly capable of eliminating contamination substances on the surface of a photomask during a lithography process
TWI571698B Method of manufacturing EUV photomask inorganic protection film component respectively deposits a silicon nitride layer on two surfaces of a graphene layer
TW201715290A A method and structure for extending the lifetime of a photomask
TW201639937A A composition for resisting ultraviolet radiation in a mask and its application
TW201638652A Mask dustproof frame structure
TW201606422A A mask protective film module and manufacturing method thereof