NANONEX CORP has a total of 18 patent applications. It increased the IP activity by 100.0%. Its first patent ever was published in 2001. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and China. Its main competitors in its focus markets machines, optics and micro-structure and nano-technology are USI FAR EAST CORP, FARRELL PATENT CO and TEC FOAM SA.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 11 | |
#2 | WIPO (World Intellectual Property Organization) | 3 | |
#3 | China | 2 | |
#4 | Australia | 1 | |
#5 | EPO (European Patent Office) | 1 |
# | Industry | |
---|---|---|
#1 | Machines | |
#2 | Optics | |
#3 | Micro-structure and nano-technology | |
#4 | Semiconductors | |
#5 | Audio-visual technology | |
#6 | Measurement | |
#7 | Chemical engineering |
# | Name | Total Patents |
---|---|---|
#1 | Chou Stephen Y | 16 |
#2 | Tan Hua | 12 |
#3 | Hu Lin | 11 |
#4 | Zhang Wei | 6 |
#5 | Kong Linshu | 2 |
#6 | Chou Stephen | 1 |
#7 | Steere Colby | 1 |
#8 | Liang Xiaogan | 1 |
#9 | Yao Yi | 1 |
#10 | Li Mingtao | 1 |
Publication | Filing date | Title |
---|---|---|
US2016031151A1 | System and methods of mold/substrate separation for imprint lithography | |
WO2014145360A1 | Imprint lithography system and method for manufacturing | |
US2014239529A1 | System and Methods For Nano-Scale Manufacturing | |
US2008122138A1 | Die imprint by double side force-balanced press for step-and-repeat imprint lithography | |
US7322287B2 | Apparatus for fluid pressure imprint lithography | |
US7717696B2 | Apparatus for double-sided imprint lithography | |
CN1457505A | Fluid pressure imprint lithography |