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MEIWA KASEI KK

Overview
  • Total Patents
    65
  • GoodIP Patent Rank
    106,539
  • Filing trend
    ⇩ 25.0%
About

MEIWA KASEI KK has a total of 65 patent applications. It decreased the IP activity by 25.0%. Its first patent ever was published in 1977. It filed its patents most often in Japan. Its main competitors in its focus markets macromolecular chemistry and polymers, semiconductors and basic materials chemistry are MEIWA PLASTIC IND LTD, DOW CORNING INC and JAPAN EPOXY RESIN KK.

Patent filings in countries

World map showing MEIWA KASEI KKs patent filings in countries
# Country Total Patents
#1 Japan 65

Patent filings per year

Chart showing MEIWA KASEI KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kuroiwa Sadaaki 16
#2 Okazaki Katsuhiko 13
#3 Okamoto Shinji 13
#4 Furumoto Takahisa 12
#5 Fujinaga Tadatoshi 11
#6 Shinoda Kyoichi 7
#7 Takenouchi Masato 7
#8 Nakae Masaru 6
#9 Kuroda Nobuyuki 5
#10 Yamazaki Hiroto 4

Latest patents

Publication Filing date Title
JP2020148825A Phenolic resin composition for photoresists and photoresist composition
JP2020105324A Phenolic resin, and curable resin composition
JP2020045423A Phenolic resin and production method thereof, and epoxy resin composition and cured product thereof
JP2019199565A Photoresist resin, method for producing photoresist resin and photoresist composition
JP2018059100A Maleimide resin and method for producing the same, maleimide resin composition and cured product
JP2018059095A Phenol resin composition, curing agent, epoxy resin composition, cured product, and semiconductor device
JP2017186578A Epoxy resin composition and application thereof
JP2017210613A Epoxy resin composition
JP2018021108A Composition, semiconductor sealing composition, and cured products thereof
JP2017031239A Aryl ether-modified biphenylaralkyl novolak resin, aryl-modified biphenylaralkyl novolak resin, method for producing the same, and composition using the same
JP2017025236A Novolac type phenolic resin, production method of the same, and photoresist composition comprising the same
JP2015117374A Maleimide compound-containing resin composition, cured product obtained by curing the same, production method of cured product, and fiber-reinforced resin molding
JP2015117375A Allyl phenol novolak resin composition, cured product obtained by curing the same, production method of cured product, and fiber-reinforced resin molding
JP2015196706A Production method of novolac type phenol resin, novolac type phenol resin, and photoresist composition
JP2015196707A Novolac type phenol resin and production method of the same, and photoresist composition using the same
JP2015124251A Phosphorus-containing epoxy resin, method for producing the same, epoxy resin composition containing the same, cured material, and copper clad laminate
JP2015067816A Epoxy resin composition, sealing material, hardened product of the composition and phenol resin
JP2015059130A Epoxy resin composition, use thereof and filler for epoxy resin composition
JP2014227428A Phosphorus-containing phenol resin and manufacturing method and use of the same
JP2014214282A Reactive diluent