MATTSON THERMAL PRODUCTS INC has a total of 18 patent applications. Its first patent ever was published in 1998. It filed its patents most often in EPO (European Patent Office), WIPO (World Intellectual Property Organization) and Taiwan. Its main competitors in its focus markets semiconductors, surface technology and coating and optics are JIANGSU HELIOS TECHNOLOGY CO LTD, FTL KK and LUMIGNTECH CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | EPO (European Patent Office) | 6 | |
#2 | WIPO (World Intellectual Property Organization) | 6 | |
#3 | Taiwan | 5 | |
#4 | United States | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Surface technology and coating | |
#3 | Optics |
# | Name | Total Patents |
---|---|---|
#1 | Koren Zion | 8 |
#2 | Cardena Rudy Santo Tomas | 7 |
#3 | Taoka James Tsuneo | 7 |
#4 | Sharangpani Rahul | 5 |
#5 | Tay Sing-Pin | 5 |
#6 | Shooshtarian Sohaila | 3 |
#7 | Zernickel Dieter | 3 |
#8 | O Carroll Conor Patrick | 3 |
#9 | Elbert Mike | 3 |
#10 | Ma Yorkman | 3 |
Publication | Filing date | Title |
---|---|---|
WO0203438A1 | Method and apparatus for rapid thermal processing (rtp) of semiconductor wafers | |
US6303524B1 | High temperature short time curing of low dielectric constant materials using rapid thermal processing techniques | |
EP1240666A2 | GROWTH OF ULTRATHIN NITRIDE ON Si(100) BY RAPID THERMAL N 2? TREATMENT | |
EP1051544A2 | Process chamber and method for depositing and/or removing material on a substrate |