| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 10 | |
| #2 | Taiwan | 2 | |
| #3 | Australia | 1 | |
| #4 | China | 1 | |
| #5 | EPO (European Patent Office) | 1 | |
| #6 | WIPO (World Intellectual Property Organization) | 1 |
| # | Industry | |
|---|---|---|
| #1 | Measurement | |
| #2 | Machines | |
| #3 | Electrical machinery and energy | |
| #4 | Semiconductors |
| # | Technology | |
|---|---|---|
| #1 | Analysing materials | |
| #2 | Measuring light | |
| #3 | Unspecified technologies | |
| #4 | Electric discharge tubes | |
| #5 | Semiconductor devices |
| # | Name | Total Patents |
|---|---|---|
| #1 | Powell Gary | 11 |
| #2 | Hazard Richard L | 5 |
| #3 | Litvak Herbert E | 4 |
| #4 | Powell Gary B | 3 |
| #5 | Litvak Herbert Elliot | 2 |
| #6 | Hazard Gary Powell Richard L | 1 |
| #7 | Litvak Herbert | 1 |
| Publication | Filing date | Title |
|---|---|---|
| US2005078300A1 | Optical control interface between controller and process chamber | |
| WO2005012855A2 | Method and apparatus for chemical monitoring | |
| US6791692B2 | Method and device utilizing plasma source for real-time gas sampling | |
| US6538734B2 | Method and device utilizing real-time gas sampling | |
| US6867859B1 | Inductively coupled plasma spectrometer for process diagnostics and control |