Sputter target, used for thin film cathodic sputter deposition, is produced or regenerated by passing an IR source over target material to effect melting on a cast plate or worn target region
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Target used for sputtering cathodes of vacuum deposition devices has protrusions extending into the target material
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Sputtering target for the deposition of nitridic or oxidic silicon layers and process for its production
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Production of a target for the sputter cathode of a vacuum coating installation
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Method for repairing target base plates
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Sputter cathode target casting apparatus has a two-layer base plate
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Target for a sputter cathode
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Process for the production of a sputtering target based on zinc sulfide and the sputtering target itself
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Sputtering target for optical storage layer deposition
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Tin or tin base alloy sputtering target
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Target for the sputter cathode of a vacuum coating plant
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Tin or tin base alloy sputtering target
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Target for the sputter cathode of a vacuum coating installation
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Sputter target production method
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Sputter target manufacturing method for surface coating installations
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High purity tin@ alloy target material for sputter coating process
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Target for the sputter cathode of a vacuum coating system and process for its production
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Boron nitride deposition target or evapn. source material
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Prodn. of indium oxide-tin oxide target for cathode sputtering
