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CVD INC

Overview
  • Total Patents
    125
About

CVD INC has a total of 125 patent applications. Its first patent ever was published in 1988. It filed its patents most often in United States, EPO (European Patent Office) and Japan. Its main competitors in its focus markets surface technology and coating, machines and materials and metallurgy are METAL DIFFUSIONS LTD, NITRUVID and KO PHILOS JONGHO.

Patent filings in countries

World map showing CVD INCs patent filings in countries

Patent filings per year

Chart showing CVD INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Goela Jitendra S 38
#2 Taylor Raymond L 37
#3 Burns Lee E 36
#4 Pickering Michael A 26
#5 Goela Jitendra Singh 16
#6 Hui Benjamin C 13
#7 Macdonald James C 13
#8 Kanjolia Ravindra K 9
#9 Reimondo Eru Teiraa 8
#10 Teverovsky Alexander 7

Latest patents

Publication Filing date Title
IL143115D0 A method for producing bulk material by chemical vapor deposition
US6221482B1 Low stress, water-clear zinc sulfide
US6464912B1 Method for producing near-net shape free standing articles by chemical vapor deposition
US6042758A Precision replication by chemical vapor deposition
US6083561A Low scatter, high quality water clear zinc sulfide
US5683028A Bonding of silicon carbide components
US5741445A Method of making lightweight closed-back mirror
US5584936A Susceptor for semiconductor wafer processing
US5618594A Composite thermocouple protection tubes
US5476549A Process for an improved laminate of ZnSe and ZnS
TW337513B Chemical vapor deposition-produced silicon carbide having improved properties and preparation process thereof
US5502227A Liquid indium source
US5350869A Purification of trialkylgallium, synthesis of trialkylgallium
CA2099788A1 Ultra pure silicon carbide and high temperature semiconductor processing equipment made therefrom
US5354580A Triangular deposition chamber for a vapor deposition system
US5453233A Method of producing domes of ZNS and ZNSE via a chemical vapor deposition technique
US5383969A Process and apparatus for supplying zinc vapor continuously to a chemical vapor deposition process from a continuous supply of solid zinc
US5374412A Highly polishable, highly thermally conductive silicon carbide
CA2058809A1 Chemical vapor deposition silicon and silicon carbide having improved optical properties
CA2057934A1 Method of fabricating lightweight honeycomb type structure