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LEWIS JAMES M

Overview
  • Total Patents
    17
About

LEWIS JAMES M has a total of 17 patent applications. Its first patent ever was published in 1986. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Canada. Its main competitors in its focus markets basic communication technologies, electrical machinery and energy and computer technology are ZBIT SEMICONDUCTOR LTD, QUICKLOGIC CORP and MOSWAY TECH LIMITED.

Patent filings in countries

World map showing LEWIS JAMES Ms patent filings in countries

Patent filings per year

Chart showing LEWIS JAMES Ms patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Lewis James M 17
#2 Walther Dane R 3
#3 Haddock Joey R 2
#4 Zuba Valentine T 1
#5 Horn Paul H 1
#6 Chin Roland L 1
#7 Ferguson Susan A 1
#8 Owens Robert A 1

Latest patents

Publication Filing date Title
US8896346B1 Self-modifying FPGA for anti-tamper applications
WO2012161763A1 Method and system for identifying counterfeit programmable devices
US2011234241A1 Method and system for protecting products and technology from integrated circuits which have been subject to tampering, stressing and replacement as well as detecting integrated circuits that have been subject to tampering
US2010213951A1 Method and system for detection of tampering related to reverse engineering
US2009129585A1 Exclusive encryption system
US8159259B1 Self-modifying FPGA for anti-tamper applications
US2007133144A1 Driver system for MOSFET based, high voltage electronic relays for AC power switching and inductive loads
US7230354B2 Driver system for MOSFET based, high voltage, electronic relays for AC power switching and inductive loads
US2006104405A1 High speed binary counter
US2006028351A1 Docking monitor
US2006007627A1 Intelligent relay system
US7183672B2 MOSFET based, high voltage, electronic relays for AC power switching and inductive loads
US7102253B2 MOSFET based, high voltage, electronic relays for AC power switching and inductive loads
CA1281578C High contrast photoresist developer with enhanced sensitivity