| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Netherlands | 6 | |
| #2 | WIPO (World Intellectual Property Organization) | 6 | |
| #3 | China | 4 | |
| #4 | Republic of Korea | 3 | |
| #5 | Taiwan | 1 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Surface technology and coating | |
| #3 | Packaging and shipping |
| # | Technology | |
|---|---|---|
| #1 | Semiconductor devices | |
| #2 | Coating metallic material | |
| #3 | Transport or storage devices |
| # | Name | Total Patents |
|---|---|---|
| #1 | Granneman Ernst Hendrik August | 12 |
| #2 | Kuznetsov Vladimir | 8 |
| #3 | Tak Pieter | 6 |
| #4 | Kuznetsov Vladimir Ivanovich | 6 |
| #5 | Van Velzen Wilhelmus Gerardus | 5 |
| #6 | Vermont Pascal Gustaaf | 4 |
| #7 | Ramirez Troxler Gonzalo Felipe | 3 |
| #8 | Van Der Wal Martijn Gerben | 2 |
| #9 | Martijn Gerben Van Der Wal | 1 |
| #10 | Wilhelmus Gerardus Van Velzen | 1 |
| Publication | Filing date | Title |
|---|---|---|
| NL2021536B1 | Substrate processing apparatus and to a method for processing substrates | |
| NL2010471C2 | Substrate processing apparatus. | |
| NL2007114C2 | Floating substrate monitoring and control device, and method for the same. | |
| NL2005049C2 | Method and apparatus for contactlessly advancing substrates. | |
| NL2004177C2 | Dynamic fluid valve and method for establishing the same. | |
| NL2003836C2 | Floating wafer track with lateral stabilization mechanism. |