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JORDAN VALLEY SEMICONDUCTORS

Overview
  • Total Patents
    58
  • GoodIP Patent Rank
    191,724
About

JORDAN VALLEY SEMICONDUCTORS has a total of 58 patent applications. Its first patent ever was published in 2004. It filed its patents most often in United States, Republic of Korea and Taiwan. Its main competitors in its focus markets measurement, semiconductors and engines, pumps and turbines are NEO MONITORS AS, TOSHIBA BETSUKUMAN KK and MATSUI SHIGERU.

Patent filings in countries

World map showing JORDAN VALLEY SEMICONDUCTORSs patent filings in countries

Patent filings per year

Chart showing JORDAN VALLEY SEMICONDUCTORSs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Mazor Isaac 32
#2 Yokhin Boris 27
#3 Berman David 16
#4 Harrison Dale A 10
#5 Wormington Matthew 9
#6 Dikopoltsev Alex 8
#7 Walsh Phillip 7
#8 Tokar Alexander 7
#9 Tokar Alex 6
#10 Peled Asher 6

Latest patents

Publication Filing date Title
US2014286473A1 Estimation of XRF intensity from an array of micro-bumps
US2013270447A1 X-ray detector assembly with shield
US2013287178A1 X-ray beam conditioning
US2013089178A1 X-ray inspection of bumps on a semiconductor substrate
TW201229503A Method and apparatus for analyzing x-ray diffraction from tilted layers
TW201140044A Method and apparatus for x-ray analysis
US2010277741A1 Combined optical metrology techniques
JP2010271309A Automated calibration methodology for vuv metrology system
US2010177324A1 Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientation
US2010171959A1 Method and apparatus for using multiple relative reflectance measurements to determine properties of a sample using vacuum ultra violet wavelengths
US2009074137A1 Accurate measurement of layer dimensions using XRF
US2009074141A1 Automated selection of X-ray reflectometry measurement locations
US2009067573A1 X-ray measurement of properties of nano-particles
US2007286344A1 Target alignment for X-ray scattering measurements
KR20080015735A Control of x-ray beam spot size
TW200809180A A method of calibrating a system that obtains reflectance data and a method of calibrating a reflectometer
TW200745537A Contamination monitoring and control techniques for use with an optical metrology instrument
IL180482D0 Inspection of small features using x - ray fluorescence
KR20070066896A Accurate measurement of layer dimensions using xrf
US2007058779A1 Multi-detector EDXRD