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ION KOGAKU KENKYUSHO KK

Overview
  • Total Patents
    18
About

ION KOGAKU KENKYUSHO KK has a total of 18 patent applications. Its first patent ever was published in 1994. It filed its patents most often in Japan. Its main competitors in its focus markets environmental technology, semiconductors and materials and metallurgy are UZOH CYPRIAN EMEKA, AQT SOLAR INC and FACCHIANO GIOVANNI.

Patent filings in countries

World map showing ION KOGAKU KENKYUSHO KKs patent filings in countries
# Country Total Patents
#1 Japan 18

Patent filings per year

Chart showing ION KOGAKU KENKYUSHO KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kajiyama Kenji 8
#2 Yoneda Tomoaki 4
#3 Iwamoto Shinya 4
#4 Hibino Yutaka 3
#5 Inoue Morio 3
#6 Otani Saburo 3
#7 Nakada Toshitake 3
#8 Nakato Yoshinori 2
#9 Watanabe Masanori 2
#10 Sato Yutaka 2

Latest patents

Publication Filing date Title
JP2000341031A Three-dimensional periodic structure and its manufacture
JP2000277448A Manufacture of crystal material and semiconductor device
JP2000273680A Oxygen generation electrode and its production
JP2000277124A Fuel cell and manufacture of electrode of fuel cell
JPH11302090A Oxidation resistance and corrosion resistance surface treatment of carbon material
JPH11266055A Semiconductor light-emitting device and manufacture thereof
JPH1175918A Ornament, hardware and manufacture thereof
JPH1140832A Thin-film solar cell and manufacture therefor
JPH10335683A Tandem-type solar cell and manufacture thereof
JPH10297996A Formation of silicon carbide thin layer
JPH10265283A Surface treatment of carbon material
JPH10223496A Single-crystal wafer and manufacture thereof
JPH1043601A Photocatalyst and its manufacture
JPH1025564A Coating method and coating device
JPH09331077A Solar cell and its manufacturing method
JPH09301799A Formation of high-resistance silicon carbide layer and silicon carbide semiconductor device
JPH0953170A Surface treatment for ferrous material
JPH08264468A Impurity doping method to silicon carbide and electrode formation method