INORGTECH LTD has a total of 14 patent applications. Its first patent ever was published in 1997. It filed its patents most often in United Kingdom, United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets organic fine chemistry, surface technology and coating and semiconductors are KABUSHIKIKAISHA KOJUNDOKAGAKU, WANG ZIYUN and WILHELM TRAUBE DR.
# | Country | Total Patents | |
---|---|---|---|
#1 | United Kingdom | 12 | |
#2 | United States | 1 | |
#3 | WIPO (World Intellectual Property Organization) | 1 |
# | Industry | |
---|---|---|
#1 | Organic fine chemistry | |
#2 | Surface technology and coating | |
#3 | Semiconductors |
# | Technology | |
---|---|---|
#1 | Special acyclic compounds | |
#2 | Acyclic or carbocyclic compounds | |
#3 | Coating metallic material | |
#4 | Semiconductor devices |
# | Name | Total Patents |
---|---|---|
#1 | Jones Anthony Copeland | 3 |
#2 | Leedham Timothy John | 1 |
#3 | Anthony Copeland Jones | 1 |
Publication | Filing date | Title |
---|---|---|
GB0129080D0 | Improved precursors for chemical vapour deposition | |
GB0125724D0 | Improved precursors for metalorganic chemical vapour deposition | |
GB0119224D0 | Precursors for metalorganic chemical vapour deposition | |
GB0010926D0 | Novel precursors for the growth of heterometal oxide films by MOCVD | |
GB9917189D0 | Metalorganic chemical vapour deposition precursor | |
GB9909434D0 | Precursors for metalorganic chemical vapour deposition | |
GB9814048D0 | Novel precursors for the growth of heterometal oxide films by MOCVD | |
GB9725220D0 | Chemical vapour deposition precursors | |
GB9709639D0 | Chemical vapour deposition precursors | |
GB9709641D0 | Chemical vapour deposition precursors |