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IHI HAUZER TECHNO COATING B V

Overview
  • Total Patents
    18
  • GoodIP Patent Rank
    167,131
  • Filing trend
    ⇩ 33.0%
About

IHI HAUZER TECHNO COATING B V has a total of 18 patent applications. It decreased the IP activity by 33.0%. Its first patent ever was published in 2007. It filed its patents most often in EPO (European Patent Office), China and United States. Its main competitors in its focus markets surface technology and coating, electrical machinery and energy and basic materials chemistry are HAUZER TECHNO COATING BV, JAPAN ELECTRONIC IND CORP and OERLIKON SURFACE SOLUTIONS AG PFÄFFIKON.

Patent filings per year

Chart showing IHI HAUZER TECHNO COATING B Vs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Doerwald Dave 8
#2 Jacobs Ruud 8
#3 Tietema Roel 7
#4 Papa Frank 4
#5 Kolev Ivan 3
#6 Peeters Paul 3
#7 Derckx Don 3
#8 Gelten Marijn 3
#9 Bosch Roel 2
#10 Kostamo Juhana 2

Latest patents

Publication Filing date Title
EP3778982A1 Method of coating one or more metal components of a fuel cell stack, component of a fuel cell stack and apparatus for coating one or more components of a fuel cell stack
EP3622864A1 Bakeware, cookware and/or grillware item, method of forming a bakeware, cookware and/or grillware item, and apparatus for coating a bakeware, cookware and / or grillware item
EP3567128A1 Deposition apparatus and method of coating spherical objects
EP3279364A1 Apparatus for coating substrates
EP2963145A1 Coating and method for its deposition to operate in boundary lubrication conditions and at elevated temperatures
EP2729955A1 Apparatus and method for the pretreatment and/or for the coating of an article in a vacuum chamber with a hipims power source
EP2628822A1 Current insulated bearing components and bearings
EP2628817A1 A coated article of martensitic steel and a method of forming a coated article of steel
EP2587518A1 Apparatus and Method for depositing Hydrogen-free ta C Layers on Workpieces and Workpiece
EP2076916A1 Dual magnetron sputtering power supply and magnetron sputtering apparatus