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HIRAMA RIKA KENKYUSHO KK

Overview
  • Total Patents
    39
  • GoodIP Patent Rank
    92,213
  • Filing trend
    ⇩ 100.0%
About

HIRAMA RIKA KENKYUSHO KK has a total of 39 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 1981. It filed its patents most often in Japan, Taiwan and China. Its main competitors in its focus markets optics, semiconductors and surface technology and coating are HIRAMA LABORATORIES CO LTD, AUROS TECH INC and NANO ELECTRO OPTICS CO LTD.

Patent filings in countries

World map showing HIRAMA RIKA KENKYUSHO KKs patent filings in countries
# Country Total Patents
#1 Japan 36
#2 Taiwan 2
#3 China 1

Patent filings per year

Chart showing HIRAMA RIKA KENKYUSHO KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Nakagawa Toshimoto 35
#2 Ogawa Osamu 13
#3 Kikukawa Makoto 7
#4 Takarayama Takahiro 6
#5 Morita Satoru 6
#6 Katagiri Yuko 4
#7 Tsukada Kozo 4
#8 Nishijima Yoshitaka 4
#9 Shiozu Shinichiro 3
#10 Shirai Hiroyuki 3

Latest patents

Publication Filing date Title
JP2019071482A Developing liquid managing method and device
JP2019045947A Method of calculating charge for service for managing concentration of chemical solution
JP2018200942A Chemical solution management system of substrate processing apparatus, chemical solution management charge calculation method of substrate processing apparatus, and chemical solution management charge calculation system of substrate processing apparatus
JP2018200943A Developer concentration management device and substrate development processing system
JP2018200941A Substrate processing system, and substrate processing charge calculation system
JP2018200940A Concentration management apparatus of chemical solution, calculation method of concentration management charge and concentration management charge calculation system, and chemical solution regenerator, calculation method of chemical solution regeneration processing charge and regeneration processing charge calculation system
JP2018120897A Device for monitoring concentration of developer, and developer management device
JP2018120901A Development device
JP2018120900A Developer management device
JP2018120895A Developing device
JP2018120898A Development device
JP2018120896A Device for displaying carbon dioxide concentration of developer, and developer management device
JP2018120894A Device for monitoring concentration of developer, and developer management device
JP2018120899A Developer management device
JP2018120893A Device for measuring component concentration of developer, and developer management device
JP2016025138A Etchant management device, etchant management method, and constituent concentration measurement method of etchant
JP2012127004A Device for managing etchant
JP2009266893A Etchant preparation equipment and etchant concentration measuring apparatus
JP2008106326A Etching liquid management apparatus
JP2003131398A Alkaline system working fluid, method and apparatus for preparing working fluid and method and apparatus for feeding working fluid