HEIDELBERG INSTR MIKROTECHNIK GMBH has a total of 14 patent applications. Its first patent ever was published in 2001. It filed its patents most often in EPO (European Patent Office), Israel and Australia. Its main competitors in its focus markets optics and measurement are MITSUMURA PRINTING, ROBERTS WILLIAM and DONGWOO FINE CHEMICAL CO LTD.
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Measurement |
# | Technology | |
---|---|---|
#1 | Photomechanical semiconductor production | |
#2 | Nonlinear optics | |
#3 | Optical systems | |
#4 | Special measuring |
# | Name | Total Patents |
---|---|---|
#1 | Kaplan Roland | 7 |
#2 | Jehle Joachim | 3 |
#3 | Mangold Alexander | 3 |
#4 | Schweitzer Michael | 3 |
#5 | Vogler Sven | 2 |
#6 | Wijnaendts-Van-Resandt Roelof | 2 |
#7 | Fangerau Michael | 2 |
#8 | Weikert Robert | 2 |
#9 | Wynaendts Van Resandt Roelof | 1 |
#10 | Diez Steffen | 1 |
Publication | Filing date | Title |
---|---|---|
EP2252857A1 | Method and arrangement for displacement | |
EP2132602A1 | Method and device for imaging a programmable mask on a substrate | |
AU2006286782A1 | Device for the optical splitting and modulation of electromagnetic radiation |