HAFEZ WALID M has a total of 12 patent applications. Its first patent ever was published in 2008. It filed its patents most often in United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, computer technology and basic communication technologies are CHANG HEON YONG, DOSILICON CO LTD and SATOH KIMIHIRO.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 10 | |
#2 | WIPO (World Intellectual Property Organization) | 2 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Computer technology | |
#3 | Basic communication technologies |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Static stores | |
#3 | Pulse technique |
# | Name | Total Patents |
---|---|---|
#1 | Hafez Walid M | 12 |
#2 | Jan Chia-Hong | 9 |
#3 | Rahman Anisur | 6 |
#4 | Tsai Curtis | 3 |
#5 | Yeh Jeng-Ya D | 3 |
#6 | Park Joodong | 3 |
#7 | Bhimarasetti Gopinath | 2 |
#8 | Munasinghe Chanaka D | 1 |
#9 | Chen Zhanping | 1 |
#10 | Yeh Jeng-Ya David | 1 |
Publication | Filing date | Title |
---|---|---|
US2014001569A1 | High voltage three-dimensional devices having dielectric liners | |
US2012163103A1 | Memory cell using BTI effects in high-k metal gate MOS | |
US2012146124A1 | Non-volatile storage element having dual work-function electrodes | |
US2012043609A1 | High-voltage transistor architectures, processes of forming same, and systems containing same | |
US2011147837A1 | Dual work function gate structures | |
WO2010078189A2 | Flash cell with integrated high-k dielectric and metal-based control gate | |
US2010164603A1 | Method of forming programmable anti-fuse element |