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GNI I PI REDKOMETALLICHESKOI P

Overview
  • Total Patents
    23
About

GNI I PI REDKOMETALLICHESKOI P has a total of 23 patent applications. Its first patent ever was published in 1969. It filed its patents most often in Netherlands, German Democratic Republic and United Kingdom. Its main competitors in its focus markets surface technology and coating, semiconductors and optics are POWDEC KK, NANTONG TONGFANG SEMICONDUCTOR CO LTD and GNI I PI REDKOMETALLITSCHESKOJ.

Patent filings in countries

World map showing GNI I PI REDKOMETALLICHESKOI Ps patent filings in countries

Patent filings per year

Chart showing GNI I PI REDKOMETALLICHESKOI Ps patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Radkevich Alexei Viktorovich 2
#2 Ivan Fedorovich Chervony 2
#3 Goriletsky Valentin Ivanovich 2
#4 Abrjutin Vladimir N 2
#5 Makarenko Grigory Grigorievich 2
#6 Apilat Vitaly Yakovlevich 2
#7 Sokolov Anatoly Mikhailovich 2
#8 Mjulendorf Oleg Sergeevich 2
#9 Belsky Arkady A 2
#10 Eidelman Lev Georgievich 2

Latest patents

Publication Filing date Title
RO102066B1 Inductor for zonal melting without crucible
RO100707B1 Proportioning plant for gaseous doping mixture preparation
GB8530824D0 Analytical autoclave
IT8220151D0 Reclaiming chloro:silane and hydrogen when mfg. silicon
DD160197A1 Process for the production of high-purity gallium
AU5951680A Producing indium by vacuum melting and electrochemical refining
DD151078A1 Method of cleaning light-melting metals of influences
DD139215A1 Device for removing the crystal from the melt on an impf crystal
NL7806998A Device for drawing a single crystal.
CH637698A5 Appliance for pulling a single crystal from a melt on a seed crystal
NL7704380A Device for epitaxial growth of periodic structures - using gas phase from sources adjacent the substrate
NL7704343A Semiconductor pressure sensor - using change in electrical resistance of multilayer structure of gallium arsenide-phosphide
NL7701539A Formation of epitaxial layers of semiconductor material - uses deposition from gas phase, with selected proportions of solid constituents added, for evaporation and subsequent deposition
NL7701541A Epitaxial growth of periodic semiconductor structures - from gaseous phase on revolving heated discs with substrates and sources
NL7700148A Emitter layer application in semiconductor prodn. - involves application of emitter from supply of an intermediate element, from which it is transferred to emitter support
AU8066775A An electrolyzer for producing andre fining metals
GB1309702A Method for measuring the flow rate of liquids and an apparatus for its realization
GB1248007A Improvements in or relating to crystallization apparatus