FUJIFILM PLANAR SOLUTIONS LLC has a total of 65 patent applications. It decreased the IP activity by 12.0%. Its first patent ever was published in 2010. It filed its patents most often in United States, Taiwan and China. Its main competitors in its focus markets basic materials chemistry, semiconductors and chemical engineering are M FSI LTD, C&G HI TECH CO LTD and SECOMEX KK.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 17 | |
#2 | Taiwan | 10 | |
#3 | China | 8 | |
#4 | Republic of Korea | 8 | |
#5 | WIPO (World Intellectual Property Organization) | 7 | |
#6 | EPO (European Patent Office) | 5 | |
#7 | Japan | 5 | |
#8 | Singapore | 4 | |
#9 | Israel | 1 |
# | Industry | |
---|---|---|
#1 | Basic materials chemistry | |
#2 | Semiconductors | |
#3 | Chemical engineering | |
#4 | Machine tools | |
#5 | Surface technology and coating | |
#6 | Packaging and shipping |
# | Technology | |
---|---|---|
#1 | Polishing compositions | |
#2 | Semiconductor devices | |
#3 | Materials for miscellaneous applications | |
#4 | Separation | |
#5 | Grinding or polishing devices | |
#6 | Metallic material removal | |
#7 | Packaging | |
#8 | Mixing | |
#9 | Soaps | |
#10 | Cleaning |
# | Name | Total Patents |
---|---|---|
#1 | Mahulikar Deepak | 31 |
#2 | Mishra Abhudaya | 22 |
#3 | Hu Bin | 13 |
#4 | Wen Richard | 12 |
#5 | Abhudaya Mishra | 11 |
#6 | Wang Luling | 11 |
#7 | Deepak Mahulikar | 9 |
#8 | Luling Wang | 7 |
#9 | Varga Tamas | 6 |
#10 | Richard Wen | 6 |
Publication | Filing date | Title |
---|---|---|
US2018340094A1 | Chemical mechanical polishing slurry for cobalt applications | |
WO2018125905A1 | Polishing compositions | |
US2018282580A1 | Polishing compositions and methods of use thereof | |
WO2017155669A1 | Advanced fluid processing methods and systems | |
SG10201505410TA | Polishing compositions and methods for selectively polishing silicon nitride over silicon oxide films | |
US2016068710A1 | Polishing compositions and methods for polishing cobalt films | |
US2016053136A1 | Reduction in large particle counts in polishing slurries | |
US2015284593A1 | Polishing compositions and methods for selectively polishing silicon nitride over silicon oxide films | |
US2014121382A1 | Hydrate forms of 1,2,4-triazole, processes for manufacture thereof, and compositions thereof | |
WO2012030423A1 | Cleaning method and system |